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                                       Details for article 33 of 138 found articles
 
 
  Development of large area nano imprint technology by step and repeat process and pattern stitching technique
 
 
Title: Development of large area nano imprint technology by step and repeat process and pattern stitching technique
Author: Cho, Youngtae
Kwon, Sin
Seo, Jung-Woo
Kim, Jeong-Gil
Cho, Jung-Woo
Park, Jung-Woo
Kim, Hyuk
Lee, Sukwon
Appeared in: Microelectronic engineering
Paging: Volume 86 (2009) nr. 12 pages 6 p.
Year: 2009
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 33 of 138 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands