|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 128 of 138 found articles
| Title: |
The effect of sputtered W-based carbide diffusion barriers on the thermal stability and void formation in copper thin films |
| Author: |
Xie, Qi Jiang, Yu-Long De Keyser, Keon Detavernier, Christophe Deduytsche, Davy Ru, Guo-Ping Qu, Xin-Ping Tu, K.N. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 87 (2010) nr. 12 pages 5 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 128 of 138 found articles
| << previous | next >> |