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Details for article 186 of 187 found articles
| Title: |
XPS studies of the ALD-growth of TaN diffusion barriers: Impact of the dielectric surface chemistry on the growth mechanism |
| Author: |
Volpi, F. Cadix, L. Berthomé, G. Blanquet, E. Jourdan, N. Torres, J. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 85 (2008) nr. 10 pages 3 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 186 of 187 found articles
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