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Journal description
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Details for article 161 of 187 found articles
| Title: |
Sub-5keV electron-beam lithography in hydrogen silsesquioxane resist |
| Author: |
Manfrinato, Vitor R. Cheong, Lin Lee Duan, Huigao Winston, Donald Smith, Henry I. Berggren, Karl K. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 88 (2011) nr. 10 pages 5 p. |
| Year: |
2011 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 161 of 187 found articles
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