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Journal description
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Details for article 100 of 187 found articles
| Title: |
Influences of bottom electrode TaN on electrical characteristics for metal–HfO2–metal capacitors |
| Author: |
Kang, Tsung-Kuei Chang, Chia-Tung Lin, Cheng-Li Wu, Wen-Fa |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 86 (2009) nr. 10 pages 5 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 100 of 187 found articles
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