|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 23 of 118 found articles
| Title: |
Etching characteristics of Si and SiO2 with a low energy argon/hydrogen d.c. plasma source |
| Author: |
Strass, A Hansch, W Bieringer, P Neubecker, A Kaesen, F Fischer, A Eisele, I |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 97 (1997) nr. 1-3 pages 5 p. |
| Year: |
1997 |
| Contents: | |
| Publisher: |
Elsevier Science S.A. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 23 of 118 found articles
| << previous | next >> |