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Effect of argon addition on CH4-H2 microwave plasma: Self-consistent simulation and nanodiamond coating deposition |
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Titel: |
Effect of argon addition on CH4-H2 microwave plasma: Self-consistent simulation and nanodiamond coating deposition |
Auteur: |
Yang, Zhiliang Guo, Zhijian An, Kang Liu, Yuchen Wang, Yunkai Wei, Junjun Liu, Jinlong Chen, Liangxian Ouyang, Xiaoping Li, Chengming |
Verschenen in: |
Surface & coatings technology |
Paginering: |
Jaargang 490 () nr. C pagina's p. |
Jaar: |
2024 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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