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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 97 of 106 found articles
| Title: |
Surface chemical reactions of etch stop prevention in plasma-enhanced atomic layer etching of silicon nitride |
| Author: |
Tercero, Jomar U. Hirata, Akiko Isobe, Michiro Karahashi, Kazuhiro Fukasawa, Masanaga Hamaguchi, Satoshi |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 477 () nr. C pages p. |
| Year: |
2024 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 97 of 106 found articles
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