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                                       Details for article 10 of 106 found articles
 
 
  Conformal growth of GaP on high aspect ratio Si structured surface via plasma-enhanced atomic layer deposition
 
 
Title: Conformal growth of GaP on high aspect ratio Si structured surface via plasma-enhanced atomic layer deposition
Author: Uvarov, Alexander
Gudovskikh, Alexander
Baranov, Artem
Maksimova, Alina
Vyacheslavova, Ekaterina
Kirilenko, Demid
Appeared in: Surface & coatings technology
Paging: Volume 477 () nr. C pages p.
Year: 2024
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 10 of 106 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands