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Journal description
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Details for article 65 of 97 found articles
| Title: |
Plasma deposition of hydrogenated amorphous carbon (a-C:H) under a wide bias potential range |
| Author: |
Serra, C. Pascual, E. Maass, F. Esteve, J. |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 47 (1991) nr. 1-3 pages 9 p. |
| Year: |
1991 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 65 of 97 found articles
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