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Optimization and mechanism of precise finishing of TC4 alloy by plasma electrolytic polishing |
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Titel: |
Optimization and mechanism of precise finishing of TC4 alloy by plasma electrolytic polishing |
Auteur: |
Zou, Yongchun Wang, Shuqi Chen, Guoliang Wang, Yaming Zhang, Kaiwei Zhang, Chaoren Wei, Daqing Ouyang, Jiahu Jia, Dechang Zhou, Yu |
Verschenen in: |
Surface & coatings technology |
Paginering: |
Jaargang 467 () nr. C pagina's p. |
Jaar: |
2023 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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