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                                       Details for article 44 of 81 found articles
 
 
  Influence of magnetic field configuration on plasma characteristics and thin film properties in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture
 
 
Title: Influence of magnetic field configuration on plasma characteristics and thin film properties in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture
Author: Zhou, Guangxue
Wang, Langping
Wang, Xiaofeng
Yu, Yonghao
Appeared in: Surface & coatings technology
Paging: Volume 409 () nr. C pages p.
Year: 2021
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 44 of 81 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands