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Tunable SiO2 to SiOxCyH films by ozone assisted chemical vapor deposition from tetraethylorthosilicate and hexamethyldisilazane mixtures |
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Titel: |
Tunable SiO2 to SiOxCyH films by ozone assisted chemical vapor deposition from tetraethylorthosilicate and hexamethyldisilazane mixtures |
Auteur: |
Topka, Konstantina Christina Diallo, Babacar Samelor, Diane Laloo, Raphael Sadowski, Daniel Genevois, Cecile Sauvage, Thierry Senocq, Francois Vergnes, Hugues Turq, Viviane Pellerin, Nadia Caussat, Brigitte Vahlas, Constantin |
Verschenen in: |
Surface & coatings technology |
Paginering: |
Jaargang 407 () nr. C pagina's p. |
Jaar: |
2021 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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