|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 61 of 74 found articles
| Title: |
Redeposition-free of silicon etching by CF4 microwave plasma in a medium vacuum process regime |
| Author: |
Pakpum, C. Boonyawan, D. |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 397 () nr. C pages p. |
| Year: |
2020 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 61 of 74 found articles
| << previous | next >> |