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Journal description
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Details for article 134 of 227 found articles
| Title: |
Novel degradation model of MOSFET thin gate oxide induced by VUV photons during high density plasma oxide deposition |
| Author: |
Kim, Moojin Lee, Jeongyun Kim, Dongkwon Min, Gyungjin |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 228 (2013) nr. S1 pages 5 p. |
| Year: |
2013 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 134 of 227 found articles
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