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                                       Details for article 24 of 45 found articles
 
 
  Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor
 
 
Title: Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor
Author: Guo, Junjie
Yang, Yafeng
Zhu, Qingshan
Fan, Chuanlin
Lv, Pengpeng
Xiang, Maoqiao
Appeared in: Surface & coatings technology
Paging: Volume 353 (2018) nr. C pages 18-24
Year: 2018
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 24 of 45 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands