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                                       Details for article 8 of 14 found articles
 
 
  Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition
 
 
Title: Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition
Author: Toko, Susumu
Torigoe, Yoshihiro
Keya, Kimitaka
Kojima, Takashi
Seo, Hyunwoong
Itagaki, Naho
Koga, Kazunori
Shiratani, Masaharu
Appeared in: Surface & coatings technology
Paging: Volume 326 (2017) nr. PB pages 7 p.
Year: 2017
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 8 of 14 found articles
 
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