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                                       Details for article 21 of 27 found articles
 
 
  Stability and extreme ultraviolet photo-reduction of graphene during C-K edge NEXAFS characterization
 
 
Title: Stability and extreme ultraviolet photo-reduction of graphene during C-K edge NEXAFS characterization
Author: Gerlin, Francesca
Zuppella, Paola
Corso, Alain Jody
Nardello, Marco
Tessarolo, Enrico
Bacco, Davide
Pelizzo, Maria Guglielmina
Appeared in: Surface & coatings technology
Paging: Volume 296 (2016) nr. C pages 5 p.
Year: 2016
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 21 of 27 found articles
 
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