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                                       Details for article 39 of 62 found articles
 
 
  Monitoring tantalum nitride thin film structure by reactive RF magnetron sputtering: Influence of processing parameters
 
 
Title: Monitoring tantalum nitride thin film structure by reactive RF magnetron sputtering: Influence of processing parameters
Author: Cheviot, Maureen
Gouné, Mohamed
Poulon-Quintin, Angéline
Appeared in: Surface & coatings technology
Paging: Volume 284 (2015) nr. C pages 192-197
Year: 2015
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 39 of 62 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands