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Modulate the deposition rate through changing the combination of frequency and pulse width at constant duty cycle |
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Titel: |
Modulate the deposition rate through changing the combination of frequency and pulse width at constant duty cycle |
Auteur: |
Wu, B.H. Wang, Y. Yu, Y. Jiang, F. Sun, H. Jing, F.J. Zhu, Shengfa Wu, Yanping Leng, Y.X. Huang, N. |
Verschenen in: |
Surface & coatings technology |
Paginering: |
Jaargang 281 (2015) nr. C pagina's 8 p. |
Jaar: |
2015 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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