|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 12 of 58 found articles
| Title: |
Effect of RF power of post-deposition oxygen treatment on HfO2 gate dielectrics |
| Author: |
Cheng, Yi-Lung Bo, Tian-Cih |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 260 (2014) nr. C pages 7 p. |
| Year: |
2014 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 58 found articles
| << previous | next >> |