Physicochemical, structural, mechanical, and tribological characteristics of Si3N4–MoS2 thin films deposited by reactive magnetron sputtering
Titel:
Physicochemical, structural, mechanical, and tribological characteristics of Si3N4–MoS2 thin films deposited by reactive magnetron sputtering
Auteur:
Trentin, Ronaldo E. Bandeira, Aline L. Cemin, Felipe Morales, Mónica Amorim, Cintia L.G. Aguzzoli, César Alvarez, Fernando Baumvol, Israel J.R. Farias, M.C.M. Figueroa, Carlos A.