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                                       Details for article 16 of 122 found articles
 
 
  Characterisation of thin SiOx-layers on float glass deposited by Combustion Chemical Vapour Deposition (C-CVD)
 
 
Title: Characterisation of thin SiOx-layers on float glass deposited by Combustion Chemical Vapour Deposition (C-CVD)
Author: Rüffer, Paul
Heft, Andreas
Linke, Ralf
Struppert, Thomas
Grünler, Bernd
Appeared in: Surface & coatings technology
Paging: Volume 232 (2013) nr. C pages 5 p.
Year: 2013
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 16 of 122 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands