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  Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors
 
 
Title: Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors
Author: Srinivasan, N.B.
Thiede, T.B.
de los Arcos, T.
Gwildies, V.
Krasnopolski, M.
Becker, H.-W.
Rogalla, D.
Devi, A.
Fischer, R.A.
Appeared in: Surface & coatings technology
Paging: Volume 230 (2013) nr. C pages 7 p.
Year: 2013
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

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