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Effect of VHF excitation frequency on localized deposition of silicon in non-equilibrium-plasma-enhanced CVD by an under-expanded supersonic jet |
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Titel: |
Effect of VHF excitation frequency on localized deposition of silicon in non-equilibrium-plasma-enhanced CVD by an under-expanded supersonic jet |
Auteur: |
Kuribayashi, Shizuma Tsunekawa, Yoshihiro Akahori, Shoji Ando, Daisuke Nakamura, Jiro Nishida, Satoshi Muta, Hiroshi Takeuchi, Yoshiaki Yamauchi, Yasuhiro Takatsuka, Hiromu |
Verschenen in: |
Surface & coatings technology |
Paginering: |
Jaargang 225 (2013) nr. C pagina's 4 p. |
Jaar: |
2013 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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