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                                       Details for article 17 of 19 found articles
 
 
  The parameter space of hydrogen content added to Ar–nitrogen sputtering gas and substrate bias voltage for the formation of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method
 
 
Title: The parameter space of hydrogen content added to Ar–nitrogen sputtering gas and substrate bias voltage for the formation of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method
Author: Ko, J.-S.
Park, J.-K.
Lee, W.-S.
Baik, Y.-J.
Appeared in: Surface & coatings technology
Paging: Volume 223 (2013) nr. C pages 4 p.
Year: 2013
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 17 of 19 found articles
 
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