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                                       Details for article 2 of 26 found articles
 
 
  Chemical vapor deposition of amorphous silicon carbide thin films on metal surfaces using monomethylsilane gas at low temperatures
 
 
Title: Chemical vapor deposition of amorphous silicon carbide thin films on metal surfaces using monomethylsilane gas at low temperatures
Author: Habuka, Hitoshi
Tsuji, Masaki
Appeared in: Surface & coatings technology
Paging: Volume 217 (2013) nr. C pages 6 p.
Year: 2013
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 2 of 26 found articles
 
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