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Journal description
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Details for article 12 of 133 found articles
| Title: |
Characteristics of SiH4/H2 VHF plasma produced by short gap discharge |
| Author: |
Nishimiya, Tatsuyuki Yamane, Tsukasa Nakao, Sachiko Takeuchi, Yoshiaki Yamauchi, Yasuhiro Takatsuka, Hiromu Muta, Hiroshi Uchino, Kiichiro Kawai, Yoshinobu |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 205 (2011) nr. S2 pages 4 p. |
| Year: |
2011 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 133 found articles
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