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Journal description
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Details for article 69 of 93 found articles
| Title: |
Plasma resistant aluminum oxide coatings for semiconductor processing apparatus by atmospheric aerosol spray method |
| Author: |
Choi, Hoomi Kim, Kwangsu Choi, Heesung Kang, Sangwoo Yun, Juyoung Shin, Yonghyeon Kim, Taesung |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 205 (2010) nr. S1 pages 4 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 69 of 93 found articles
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