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                                       Details for article 18 of 34 found articles
 
 
  High rate reactive magnetron sputtering of ZnO:Al films from rotating metallic targets
 
 
Title: High rate reactive magnetron sputtering of ZnO:Al films from rotating metallic targets
Author: Zhu, H.
Hüpkes, J.
Bunte, E.
Huang, S.M.
Appeared in: Surface & coatings technology
Paging: Volume 205 (2010) nr. 3 pages 7 p.
Year: 2010
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 18 of 34 found articles
 
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