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Journal description
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Details for article 21 of 32 found articles
| Title: |
Role of silicon on the growth mechanisms of CN x and SiCN thin films by N2/CH4 microwave plasma assisted chemical vapour deposition |
| Author: |
Kouakou, Paul Belmahi, Mohammed Brien, Valérie Hody, Virginie Migeon, Henri-Noël Bougdira, Jamal |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 203 (2008) nr. 3-4 pages 7 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 21 of 32 found articles
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