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                                       Details for article 23 of 25 found articles
 
 
  The influence of plasma power on the temperature-dependant conductivity and on the wet chemical etch rate of sputter-deposited alumina thin films
 
 
Title: The influence of plasma power on the temperature-dependant conductivity and on the wet chemical etch rate of sputter-deposited alumina thin films
Author: Fricke, S.
Friedberger, A.
Schmid, U.
Appeared in: Surface & coatings technology
Paging: Volume 203 (2009) nr. 19 pages 5 p.
Year: 2009
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 23 of 25 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands