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Details for article 18 of 23 found articles
| Title: |
Structural characterization of amorphous hydrogenated-carbon nitride (aH-CN x ) film deposited by CH4/N2 dielectric barrier discharge plasma: 13C, 1H solid state NMR, FTIR and elemental analysis |
| Author: |
Majumdar, Abhijit Scholz, Gudrun Hippler, Rainer |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 203 (2009) nr. 14 pages 4 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 18 of 23 found articles
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