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Journal description
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Details for article 12 of 28 found articles
| Title: |
Effect of H2 dilution gas on the growth of ZrC during low pressure chemical vapor deposition in the ZrCl4–CH4–Ar system |
| Author: |
Park, Jong Hoon Jung, Choong Hwan Kim, Do Jin Park, Ji Yeon |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 203 (2008) nr. 1-2 pages 4 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 28 found articles
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