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Journal description
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Details for article 94 of 135 found articles
| Title: |
Plasma characteristics of low-k SiOC(–H) films prepared by using plasma enhanced chemical vapor deposition from DMDMS/O2 precursors |
| Author: |
Jung, An Soo Navamathavan, R. Lee, Kwang Man Choi, Chi Kyu |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 202 (2008) nr. 22-23 pages 4 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 94 of 135 found articles
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