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Journal description
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Details for article 105 of 135 found articles
| Title: |
Properties of Si x N y thin film deposited by plasma enhanced chemical vapor deposition at low temperature using SiH4/NH3/Ar as diffusion barrier film |
| Author: |
Pham, Thuy T.T. Lee, J.H. Kim, Y.S. Yeom, G.Y. |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 202 (2008) nr. 22-23 pages 4 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 105 of 135 found articles
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