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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 21 of 213 found articles
| Title: |
Chemical dry etching of silicon nitride in F2/Ar remote plasmas |
| Author: |
Hwang, J.Y. Kim, D.J. Lee, N.-E. Jang, Y.C. Bae, G.H. |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 201 (2007) nr. 9-11 pages 4 p. |
| Year: |
2007 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 21 of 213 found articles
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