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                                       Details for article 88 of 191 found articles
 
 
  Influence of substrate temperature on morphology of SiO x films deposited on particles by PECVD
 
 
Title: Influence of substrate temperature on morphology of SiO x films deposited on particles by PECVD
Author: Borer, B.
Sonnenfeld, A.
Rudolf von Rohr, Ph.
Appeared in: Surface & coatings technology
Paging: Volume 201 (2006) nr. 3-4 pages 6 p.
Year: 2006
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 88 of 191 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands