Deposition of TiO2 thin films by atmospheric plasma post-discharge assisted injection MOCVD
Titel:
Deposition of TiO2 thin films by atmospheric plasma post-discharge assisted injection MOCVD
Auteur:
Jiménez, C. De Barros, D. Darraz, A. Deschanvres, J.-L. Rapenne, L. Chaudouët, P. Méndez, J.E. Weiss, F. Thomachot, M. Sindzingre, T. Berthomé, G. Ferrer, F.J.