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Journal description
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Details for article 26 of 37 found articles
| Title: |
Residual stress analysis—an important consideration for coating of stereolithography polymers |
| Author: |
Luan, Ben Liu, Xing Yang Nagata, John Cheong, Woo-Jae |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 192 (2005) nr. 2-3 pages 8 p. |
| Year: |
2005 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 26 of 37 found articles
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