|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 13 of 20 found articles
| Title: |
Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glass |
| Author: |
Iliescu, Ciprian Miao, Jianmin Tay, Francis E.H. |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 192 (2005) nr. 1 pages 5 p. |
| Year: |
2005 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 13 of 20 found articles
| << previous | next >> |