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Journal description
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Details for article 14 of 32 found articles
| Title: |
Influence of argon flow rate on TiO2 photocatalyst film deposited by dc reactive magnetron sputtering |
| Author: |
Zhang, Wenjie Li, Ying Zhu, Shenglong Wang, Fuhui |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 182 (2004) nr. 2-3 pages 7 p. |
| Year: |
2004 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 14 of 32 found articles
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