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Journal description
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Details for article 23 of 32 found articles
| Title: |
New type of plasma reactor for thin film deposition: magnetron plasma process assisted by microwaves to ionise sputtered vapour |
| Author: |
Boisse-Laporte, C. Leroy, O. de Poucques, L. Agius, B. Bretagne, J. Hugon, M.C. Teulé-Gay, L. Touzeau, M. |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 179 (2004) nr. 2-3 pages 6 p. |
| Year: |
2004 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 23 of 32 found articles
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