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  Influence of substrate bias voltage on deposition behavior and micro-indentation hardness of Ti–Si–N coatings by a hybrid coating system of arc ion plating and sputtering techniques
 
 
Title: Influence of substrate bias voltage on deposition behavior and micro-indentation hardness of Ti–Si–N coatings by a hybrid coating system of arc ion plating and sputtering techniques
Author: Choi, Sung Ryong
Park, In-Wook
Park, Jong Hyun
Kim, Kwang Ho
Appeared in: Surface & coatings technology
Paging: Volume 179 (2004) nr. 1 pages 6 p.
Year: 2004
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 10 of 17 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands