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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
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Details for article 22 of 29 found articles
| Title: |
Optical emission study of CH4+CHF3 ECR plasma and properties of a-C:F:H films |
| Author: |
Xin, Y Ning, Z.Y Ye, C Lu, X.H Xiang, S.L Du, W Huang, S Chen, J Cheng, S.H |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 173 (2003) nr. 2-3 pages 6 p. |
| Year: |
2003 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 22 of 29 found articles
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