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Journal description
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Details for article 7 of 13 found articles
| Title: |
Kinetics of chemical vapor deposition of Si on Ni substrates from a SiCl4–H2 gas precursor mixture |
| Author: |
Yoon, Jin-Kook Kim, Gyeung-Ho Byun, Ji-Young Lee, Jong-Kwon Kim, Jae-Soo Hong, Kyung-Tae |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 172 (2003) nr. 1 pages 7 p. |
| Year: |
2003 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 7 of 13 found articles
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