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Journal description
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Details for article 9 of 15 found articles
| Title: |
Influence of fluorine doping on SiO x F y films prepared from a TEOS/O2/CF4 mixture using a plasma enhanced chemical vapor deposition system |
| Author: |
Jeong, Sang-Hun Nishii, Junji Park, Hyuk-Ryul Kim, Jae-Keun Lee, Byung-Teak |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 168 (2003) nr. 1 pages 6 p. |
| Year: |
2003 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 9 of 15 found articles
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