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                                       Details for article 16 of 26 found articles
 
 
  Investigation of the rf and dc hollow cathode plasma-jet sputtering systems for the deposition of silicon thin films
 
 
Title: Investigation of the rf and dc hollow cathode plasma-jet sputtering systems for the deposition of silicon thin films
Author: Hubička, Z.
Pribil, G.
Soukup, R.J.
Ianno, N.J.
Appeared in: Surface & coatings technology
Paging: Volume 160 (2002) nr. 2-3 pages 10 p.
Year: 2002
Contents:
Publisher: Elsevier Science B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 16 of 26 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands