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                                       Details for article 24 of 24 found articles
 
 
  Two-dimensional modeling and optimization of a neutral loop discharge etcher in an argon plasma
 
 
Title: Two-dimensional modeling and optimization of a neutral loop discharge etcher in an argon plasma
Author: Okraku-Yirenkyi, Yaw
Sung, Youl-Moon
Otsubo, Masahisa
Honda, Chikahisa
Sakoda, Tatsuya
Appeared in: Surface & coatings technology
Paging: Volume 149 (2002) nr. 2-3 pages 7 p.
Year: 2002
Contents:
Publisher: Elsevier Science B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 24 of 24 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands