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                                       Details for article 10 of 13 found articles
 
 
  Preparation of amorphous Si1−x C x (0≤x≤1) films by alternate deposition of Si and C thin layers using a dual magnetron sputtering source
 
 
Title: Preparation of amorphous Si1−x C x (0≤x≤1) films by alternate deposition of Si and C thin layers using a dual magnetron sputtering source
Author: Kikuchi, Naoto
Kusano, Eiji
Tanaka, Tatsuya
Kinbara, Akira
Nanto, Hidehito
Appeared in: Surface & coatings technology
Paging: Volume 149 (2002) nr. 1 pages 6 p.
Year: 2002
Contents:
Publisher: Elsevier Science B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 10 of 13 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands